JPS6323707Y2 - - Google Patents
Info
- Publication number
- JPS6323707Y2 JPS6323707Y2 JP1985016957U JP1695785U JPS6323707Y2 JP S6323707 Y2 JPS6323707 Y2 JP S6323707Y2 JP 1985016957 U JP1985016957 U JP 1985016957U JP 1695785 U JP1695785 U JP 1695785U JP S6323707 Y2 JPS6323707 Y2 JP S6323707Y2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- chuck
- rotary table
- pins
- transparent substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 description 18
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985016957U JPS6323707Y2 (en]) | 1985-02-08 | 1985-02-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985016957U JPS6323707Y2 (en]) | 1985-02-08 | 1985-02-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61132841U JPS61132841U (en]) | 1986-08-19 |
| JPS6323707Y2 true JPS6323707Y2 (en]) | 1988-06-29 |
Family
ID=30504215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985016957U Expired JPS6323707Y2 (en]) | 1985-02-08 | 1985-02-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6323707Y2 (en]) |
-
1985
- 1985-02-08 JP JP1985016957U patent/JPS6323707Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61132841U (en]) | 1986-08-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4275420B2 (ja) | 基板処理装置および基板処理方法 | |
| JPS6323707Y2 (en]) | ||
| JPH05253853A (ja) | 薄片吸着装置および薄片吸着装置の洗浄方法 | |
| JP2000208591A (ja) | 回転式基板処理装置 | |
| JPH11251414A (ja) | 機械式スピンチャック | |
| JPH0536811A (ja) | ウエハ処理テーブル及びウエハ処理装置 | |
| JP2657392B2 (ja) | 回転処理装置 | |
| JPH0330426A (ja) | ウエハー裏面洗浄装置 | |
| JP3362069B2 (ja) | スピン処理装置 | |
| JPH03785B2 (en]) | ||
| JP2887112B2 (ja) | スピン処理装置 | |
| JP2004048034A (ja) | 基板回転保持装置および回転式基板処理装置 | |
| JP2000156391A (ja) | 半導体ウェーハ検査装置 | |
| JP2526199Y2 (ja) | ウェハホルダの固定構造 | |
| JPH02164021A (ja) | 角型半導体基板の固定治具 | |
| US4588379A (en) | Configuration for temperature treatment of substrates, in particular semi-conductor crystal wafers | |
| JP2908408B2 (ja) | ワークのスピン乾燥方法 | |
| JPH04364729A (ja) | ウエーハのノッチ部面取り装置 | |
| JPH08290095A (ja) | 回転式基板塗布装置 | |
| JPH05259056A (ja) | 半導体基板のスピンコーティング装置 | |
| JP2002001254A (ja) | 処理物回転処理装置 | |
| JPH0632673Y2 (ja) | レジスト塗布装置 | |
| JPS6323705Y2 (en]) | ||
| JP2532708Y2 (ja) | ウエハ回転処理装置 | |
| KR20000017914U (ko) | 반도체 제조 공정에 사용되는 스핀들 척 |